Fours verticaux pour 150mm et 200mm wafer
JTEKT Thermo Systems est représentée en Europe par
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The successful VF-5100 vertical furnace series employs a robot arm to convey wafers ranging in diameter from 4 to 8 inches.
The VF-5100 was developed in 1990 as JTEKT Thermo Systems's (previously Koyo Thermo Systems) first vertical furnace featuring robot-based conveyance. This popular model is presently being used production facilities throughout the world. The wafer conveying system is very reliable and maintenance is simple. The cassette stocker is arranged on a turntable, and a single-armed this word is same as VF-5100 robot is used to convey the wafers. VF-5100's heating element enjoys a high degree of customer satisfaction.
Features | |||
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Specification | |||||||||
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Model | VF-5100 | ||||||||
Wafer size | 4" - "8 | ||||||||
Outside dimension(mm) | W1000 x D1950 x H3250 | ||||||||
Batch size | 150 | ||||||||
Continual treatment | - | ||||||||
Heater | LGO heater | ||||||||
Service temperature | 300 - 1050°C | ||||||||
Flat zone(mm) | 960 | ||||||||
Temperature control | 4zone | ||||||||
Cassette stock | 8 | ||||||||
Process cassette | 6 | ||||||||
Dummy cassette | 1 | ||||||||
Monitor cassette | 1 | ||||||||
Wafer transfer | vacuum/vacuumless | ||||||||
Finger | 5 | ||||||||
Controller | Model 1000 | ||||||||
Applicable to SECS | possible | ||||||||
Applicable to AGV | possible | ||||||||
Applicable to SMIF/FOUP | possible |
A Summary of Process Performance | |||||||||
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Pyro.Ox Thick film |
Pyro.Ox Thin film |
P-D-Poly | Poly-Si | HTO | Si3N4 | TEOS | |||
Reaction gas | O2.H2 | O2.H2 | SiH4.PH3.H2 | SiH4 | SiH2Cl2.N2O | SiH2Cl2.NH3 | Si(C2H5O)4.O2 | ||
Growth temp.(deg.-c) | 1000 - 1250 | 800 - 1000 | 550 - 600 | 600 - 620 | 870 - 890 | 770 - 800 | - 750 | ||
Growth rate(A/min) | - | - | 12 - 20 | 60 - 100 | 40 - 50 | 20 - 50 | - 100 | ||
Number of wafer(sheet) | 150 | 150 | 25 | 100 | 100 | 100 | 100/50 | ||
Thickness variation(%) |
Inside wafer | 2 | 2 | 3 | 2 | 3 | 3 | 4 | 3 |
Between wafers | 2 | 2 | 2 | 2 | 3 | 2 | 3 | 2 | |
Between batches | 2 | 2 | 2 | 1 | 2 | 2 | 2 | 2 |
Crystec Technology Trading GmbH, Germany, www.crystec.com, +49 8671 882173, FAX 882177
The VF-5900 furnace is a continuation of the
VF-530The VF-5300 vertical furnace can process 8-inch wafers in batches
of up to 150 wafers per run. This furnace has been designed with
factory automation in mind and is compatible with AGV and SMIF systems.
The VF-5300 represents the evolution of the VF-5100 model and can stock 20 cassettes at a time. An optional feature allows the VF-5300 to process up to 3 batches in succession. This high-performance furnace has all the features required in an 8-inch wafer furnace and is widely used both in Japan and overseas. The multi-level turntable stocker makes operator training extremely simple. The functions that transfer the cassettes and wafers are very reliable and adaptable. The LGO heating element creates a long, stable uniform heating length, and has excellent stability and heat-up/cool-down characteristics at low temperatures.
Features | |||
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|
Specification | |||||||||
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Model | VF-5300 | ||||||||
Wafer size | 4" - "8 | ||||||||
Outside dimension(mm) | W900 x D2300 x H3250 | ||||||||
Batch size | 150 | ||||||||
Continuous treatment | 2/3 batch | ||||||||
Heater | LGO heater | ||||||||
Service temperature | 300 - 1050deg.-c | ||||||||
Flat zone(mm) | 960 | ||||||||
Temperature control | 4zone | ||||||||
Cassette stock | 20 | ||||||||
Process cassette | 12 | ||||||||
Dummy cassette | 5 | ||||||||
Monitor cassette | 3 | ||||||||
Wafer transfer | vacuumless | ||||||||
Finger | 5+1 | ||||||||
Controller | Model 1100 | ||||||||
Applicable to SECS | possible | ||||||||
Applicable to AGV | possible | ||||||||
Applicable to SMIF/FOUP | possible |
A Summary of Process Performance | |||||||||
---|---|---|---|---|---|---|---|---|---|
Pyro.Ox Thick film |
Pyro.Ox Thin film |
P-D-Poly | Poly-Si | HTO | Si3N4 | TEOS | |||
Reaction gas | O2.H2 | O2.H2 | SiH4.PH3.H2 | SiH4 | SiH2Cl2.N2O | SiH2Cl2.NH3 | Si(C2H5O)4.O2 | ||
Growth temp.(deg.-c) | 1000 - 1250 | 800 - 1000 | 550 - 600 | 600 - 620 | 870 - 890 | 770 - 800 | - 750 | ||
Growth rate(A/min) | - | - | 12 - 20 | 60 - 100 | 40 - 50 | 20 - 50 | - 100 | ||
Number of wafer(sheet) | 150 | 150 | 25 | 100 | 100 | 100 | 100/50 | ||
Thickness variation(%) |
Inside wafer | 2 | 2 | 3 | 2 | 3 | 3 | 4 | 3 |
Between wafers | 2 | 2 | 2 | 2 | 3 | 2 | 3 | 2 | |
Between batches | 2 | 2 | 2 | 1 | 2 | 2 | 2 | 2 |
Crystec Technology Trading GmbH, Germany, www.crystec.com, +33/476/911002, FAX 911168
Tous les modèles de fours listés ci-dessus répondent aux normes CE et sont certifiés chez le constructeur par un organisme agréé.
Utilisez ce lien pour en savoir plus sur: Comparaison des Fours Verticaux et Horizonteaux.!
JTEKT Thermo Systems et Crystec sont prêts à étudier pour vous, le système qui répondra à vos exigences en présentant le meilleur rapport qualité / prix.