Furnaces for the LCD Industry

JTEKT Thermo Systems (formerly Koyo Thermo Systems) is the world-leading manufacturer of thermal systems for the flat panel display (FPD) industry. JTEKT Thermo Systems supplies equipment for liquid crystal display production (LCD), for the manufacture of STN screens (super twisted nematic displays) and AMLCDs (active matrix liquid crystal displays) as well as for producing TFT displays (thin film transistor displays). JTEKT Thermo Systems also manufactures machines for electroluminescent displays (ELD), field emission displays (FED) and plasma display panels (PDP). The most important applications are glass plate tempering, pre-drying of sealants, seal curing, color fixation and polyimide curing. This page provides an overview of the equipment for these applications. This is not an complete list. Please contact us if you require further information.

Clean Batch System (CBS)

The Clean Batch System CBS series was developed for challenging thermal process steps in modern display and electronics manufacturing. With its robust system concept it combines high process stability with maximum efficiency and enables integration into fully automated production lines.

The equipment features a maintenance-friendly design that ensures high availability, and a flexible architecture that can be adapted to different production environments. The CBS series thus provides a future-proof platform for a variety of heat treatment processes, from accelerated curing cycles to precise post-bake applications.

Specification
Technical Features Product Data
System type Batch-based clean furnace system for LTPS processes
Layout flexibility Various layouts depending on production volume and substrate size
Maintenance Maintenance possible without a full production stop
Residual oxygen content ≤ 20 ppm after 90 minutes N₂ purge
Automation Host control, CIM/AGV-capable, automatic recipe management
Max. temperature Up to 500 °C (ultra-high temperature HEPA filter)
Cleanroom class Class 10 (0.3 µm)
Cooling system Forced oven cooling for reduced cycle times
Ramp-up time approx. 30 min (100 → 250 °C)
Ramp-down time approx. 60 min (250 → 100 °C)
Applications Post-bake, polyimide curing, various annealing processes
CBS furnace
Single Substrate Clean Batch System (CCBS)

The Clean Batch System CCBS series supports glass sizes up to 10th generation and offers highest productivity while maintaining first-class cleanliness. Its fully protected process handling enables damage-free substrate processing and reliably controls sublimates generated during post-bake processes. With flexible layout options, easy maintenance during ongoing batch operation and comprehensive automability, the system is a powerful solution for modern display and electronics production.

Specification
Technical Features Product Data
Supported substrate sizes W300 × L400 to W3000 × L3200 mm
Temperature range 80 to 250 °C
Temperature accuracy ±3 °C
Productivity High process speed and short cycle times
Cleanliness Class 10 (0.3 μm)
Sublimate control Effective handling of sublimates in post-bake processes
Layout flexibility Various configurations depending on volume & substrate size
Transfer mechanism Single-substrate transfer, reduced initial & transfer costs
Applications Post-bake of color filter coatings, tempering, sealing, main curing and pre-curing, firing of alignment layers
CCBS furnace
Automation for CBS and CCBS
CBS layout CCBS layout
INH Box Oven
INH box oven
Equipment for Heat Treatment in Liquid Crystal Display Production
Walking-beam furnace
Automated clean furnace station SO2
Roller-type furnace
Specification
Technical Features Product Data
Overall dimensions W2000 × D2000 × H4350 mm (oven body)
Operating temperature 200 to 600 °C
Substrate size LCD/OLED: 730×920 mm (other sizes on request)
Advanced Semiconductor Packaging: 300×300, 510×515, 600×600 mm
Batch size 24 wafers; dependent on wafer thickness and warp
Chamber material High-quality quartz
Controller Model VSC1000
Options Forced cooling system
OST communication (SECS/GEM)
Applications LCD/OLED: contact and post-bake annealing, activation annealing
Advanced Semiconductor Packaging: curing of RDL and PCB, reflow after solder bumping
vfs-4000
Heat Treatment in the Production of Plasma Display Panels

Continuous roller-transport furnace

JTEKT Thermo Systems offers custom-made continuous furnace systems that combine the highest temperature uniformity, cleanliness and transport precision. By combining advanced heating technology, stable transport systems and a cleaning-optimized oven design, these systems are ideal for demanding industrial processes.

Whether large-format glass plates, flexible films or metallic carrier frames, the systems enable clean, gentle and efficient heat processes while maintaining high yield. Robust construction ensures maximum process consistency while state-of-the-art transport and insulation technology significantly increase productivity.

Specification
Technical Features Product Data
Transport options Chain, mesh belt, Teflon belt, walking beam, roller bed, index, roll-to-roll and more
Process atmospheres Various process gases supported
Applications Resin curing, drying processes, annealing.
Roll material Steel-core rolls with alumina ceramic tubes to avoid metallic contamination.
Transport drive Special chain system prevents slip between glass and rolls.
Substrate capacity Parallel processing of two glass layers using a spacer system.
Oven chamber Cleanroom-optimized special glass muffle.
Heating system Moldatherm™ far-infrared heaters for stable, homogeneous heat transfer.
Temperature uniformity <1 °C across the entire glass plate.
Continuous furnace

JTEKT Thermo Systems and Crystec look forward to building a cost-effective system for you that meets your most demanding requirements.